工口色情片

ALD Research

ALD Research

The 工口色情片 ALD Science team is involved in many fields of leading-edge ALD and SAMS research. While all our work can not necessarily be shared, below is a list of references published by our team.

2018

  • Lecordier, L., Herregods, S. & Armini, S. Vapor-deposited octadecanethiol masking layer on copper to enable area selective Hf3N4 atomic layer deposition on dielectrics studied by in situ spectroscopic ellipsometry. Journal Of Vacuum Science & Technology A-Vacuum Surfaces And Films36, 031605鈥9 (2018).
  • R. Bhatia, 鈥淧recursor Dependent optical properties of ALD TiO2鈥, 17th Intern. ALD conf., 2018, Incheon
  • T. Walter, K. Cooley, A. Bertuch, S. Mohney, 鈥淓ffect of substrate on MoS2 deposited by plasma enhanced atomic layer deposition鈥, 17th Intern. ALD conf., 2018, Incheon
  • G. Sundaram, 鈥淎LD in Life Sciences鈥, EFDS ALD for Industry 2nd workshop, 2018, Dresden DE

2017

  • Liu, Luting, Ritwik Bhatia, and Thomas J. Webster. “Atomic layer deposition of nano-TiO2 thin films with enhanced biocompatibility and antimicrobial activity for orthopedic implants.” International journal of nanomedicine 12 (2017): 8711.
  • Sowa, Mark J., Yonas Yemane, Jinsong Zhang, Johanna C. Palmstrom, Ling Ju, Nicholas C. Strandwitz, Fritz B. Prinz, and J. Provine. “Plasma-enhanced atomic layer deposition of superconducting niobium nitride.” Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films 35, no. 1 (2017): 01B143.
  • Bertuch, Adam, Brent D. Keller, Nicola Ferralis, Jeffrey C. Grossman, and Ganesh Sundaram. “Plasma enhanced atomic layer deposition of molybdenum carbide and nitride with bis (tert-butylimido) bis (dimethylamido) molybdenum.” Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films 35, no. 1 (2017): 01B141.
  • Yemane, Y. T., M. J. Sowa, J. Zhang, L. Ju, E. W. Deguns, N. C. Strandwitz, F. B. Prinz, and J. Provine. “Superconducting niobium titanium nitride thin films deposited by plasma-enhanced atomic layer deposition.” Superconductor Science and Technology 30, no. 9 (2017): 095010.
  • Takeuchi, Kazuma, Yuichiro Ezoe, Kumi Ishikawa, Masaki Numazawa, Masaru Terada, Daiki Ishi, Maiko Fujitani, Mark J. Sowa, Takaya Ohashi, and Kazuhisa Mitsuda. “Pt thermal atomic layer deposition for silicon x-ray micropore optics.” Applied optics 57, no. 12 (2018): 3237-3243.
  • Keller, Brent D., Adam Bertuch, J. Provine, Ganesh Sundaram, Nicola Ferralis, and Jeffrey C. Grossman. “Process control of atomic layer deposition molybdenum oxide nucleation and sulfidation to large-area MoS2 monolayers.” Chemistry of Materials 29, no. 5 (2017): 2024-2032.
  • M. Sowa, 鈥淢echanical, physical, and electrical properties of PEALD VN using TDMAV and N2 plasma鈥, AVS2017, Orlando CA

2016

  • Bertuch, A., Keller, B. D., Ferralis, N., Grossman, J. C. & Sundaram, G. 鈥淧lasma enhanced atomic layer deposition of molybdenum carbide and nitride with bis(tert-butylimido)bis(dimethylamido) molybdenum.鈥 Journal Of Vacuum Science & Technology A-Vacuum Surfaces And Films 35, 01B141 (2016).
  • Sowa, M. J. et al. 鈥淧lasma-enhanced atomic layer deposition of superconducting niobium nitride.鈥 Journal Of Vacuum Science & Technology A-Vacuum Surfaces And Films 35, 01B143 (2016).
  • Sowa, M. J., Yemane, Y., Prinz, F. B. & Provine, J. 鈥淧lasma-enhanced atomic layer deposition of tungsten nitride.鈥 Journal Of Vacuum Science & Technology A-Vacuum Surfaces And Films 34, 051516 (2016).
  • L. Lecordier, S. Armini, 鈥淣ovel method to achieve area selective ALD on copper metal vs. SiO2 using vapor-phase deposited SAMS鈥, 16th Intern. ALD conference, 2016, Dublin 鈥
  • A. Bertuch, B. Keller, N. Ferralis, J.C. Grossman, G. Sundaram, 鈥淧lasma enhanced atomic layer deposition of molybdenum nitride鈥, 16th Intern. ALD conference, 2016, Dublin 鈥
  • R. Bhatia, 鈥淐ontrolling smoothness of thin Pt ALD films鈥, 16th Intern. ALD conference, 2016, Dublin 鈥
  • M. Sowa, 鈥淧lasma enhance atomic layer deposition of superconducting NbN films鈥, 16th Intern. ALD conference, 2016, Dublin 鈥
  • B. Keller, A. Bertuch, F. Pinna, N. Ferralis, J. Provine, G. Sundara2, and J. Grossman, 鈥淭wo-Dimensional Molybdenum Disulfide from ALD Molybdenum Oxide鈥, 2016 MRS Spring Meeting, Phoenix庐

2015

  • B. Keller, A. Bertuch, N. Ferralis, J. Provine, J.C. Grossman, and G. Sundaram, 鈥淕rowth, Characterization, and Application of Two-Dimensional Molybdenum Disulfide鈥, 15th Intern. ALD conference, 2015, Portland, OR
  • S. Warnat, C. Forbrigger, T. Hubbard, A. Bertuch, and G. Sundaram, 鈥淭hermal MEMS actuator operation in aqueous media/seawater: Performance enhancement through atomic layer deposition post processing of PolyMUMPs devices鈥, J. Vac. Sci. Technol. A 33, 01A126 (2015)
  • L. Lecordier, Atomic layer deposition and in-situ characterization of Y2O3 and Yttria stabilized Zirconia, 228th ECS conference proceedings, 2015, Phoenix庐 AZ
  • Sowa, M. J., Plasma Enhanced Atomic Layer Deposition of Tungsten Nitride, 15th Intern. ALD conference, 2015, Portland, OR
  • C. Waldfried, W. Neff, I.-K. Lin, and R. Bhatia, 鈥淭hermal Stability of Thick ALD Al2O3 Films, 15th Intern. ALD conference, 2015, Portland, OR
  • Jonathan McBee, 鈥淐omputer Science for the G Programmer: The Dependency Inversion Principle鈥, LabView Craftsmanship Conference, Boston, MA, 2015

2014

  • A. Bertuch, G. Sundaram, M. Saly, D. Mosher, and R. Kanjolia, 鈥淎tomic Layer Deposition of Molybdenum Oxide using bis(tert-butylimido)bis(dimethylamido) molybdenum鈥, J. Vac. Sci. Technol A, Vol.32, Issue 1. 2014
  • Lecordier L., et al, In-situ based process optimization of Lithium-based multicomponent oxides, in 14th Intern. ALD conference, 2014, Kyoto, Japan
  • Sowa, M. J., Role of plasma enhanced atomic layer deposition reactor wall conditions on radical and ion substrate fluxes, J. Vac. Sci. Technol, A 32, 01A106 (2014),
  • G. Sundaram., L. Lecordier, 鈥淚n-situ process optimization of multinary ALD films鈥, Belux Workshop, 2014 Belvaux, (Luxumbourg)

2013

  • G. Sundaram *鈥淎tomic Layer Deposition and Self-Assembled Molecules鈥, Annual IAP Meeting, Georgia Institute of Technology, Atlanta, GA, 2013
  • Webinar: M. Sowa 鈥淗ow to Expand Your Research Capability with Atomic Layer Deposition鈥, May 2013.
  • R. Bhatia, J. Provine, G. Liu 鈥淓ffect of Oxidant and Deposition Temperature on ALD Iron Oxide 鈥, 13th Intern. ALD conference, 2013, San Diego, CA
  • M. Sowa, 鈥淩ole Of PEALD Reactor Wall Conditions On Radical And Ion Substrate Fluxes 鈥, 13th Intern. ALD conference, 2013, San Diego, CA
  • A. Bertuch, G. Sundaram, M. Saly, D. Moser, R. Kanjolia 鈥淎tomic Layer Deposition of Molybdenum Oxide using bis(tert-butylimido)bis(dimethylamido) molybdenum 鈥, 13th Intern. ALD conference, 2013, San Diego, CA
  • G. Sundaram, *鈥淭he Use of Atomic Layer Deposition in Energy Related Applications 鈥, 60th International American Vacuum Society Symposium, Long Beach, CA, 2013
  • G. Sundaram, L. Lecordier. R. Bhatia, *鈥淰apor Phase Surface Functionalization using Atomic Layer Deposition (ALD) and Self Assembled Monolayers (SAMs) 鈥, International Meeting of the Electrochemical Society, San Francisco, CA, 2013

2012

  • G.M. Sundaram, L. Lecordier, M. Sershen, M.J. Dalberth, M. Ruffo, S. Magner. R. Bhatia, R. Coutu, and J.S. Becker 鈥淚ndustrialization of Atomic Layer Deposition (ALD): A Path for R2R Applications鈥, Flextech International Conference, Phoenix庐 AZ, 2012
  • L. Lecordier, M. Dalberth, M. Sershen, M. Ruffo, R. Coutu, G. Sundaram, and J. Becker 鈥淒esign Iterations and Process Optimization of a Spatial ALD System, for High Throughput Roll-to-Roll Applications鈥, 12th Intern. ALD conference, 2012, Dresden, Germany
  • Guo Liu, Eric W. Deguns, Ganesh Sundaram, and Jill S. BeckerConformal Fe, Co, and Ni Films from Oxides and Nitrides Grown by Atomic Layer Deposition, Guo Liu, Eric W. Deguns, Ganesh Sundaram, and Jill S. Becker, 12th Intern. ALD conference, 2012, Dresden, Germany
  • Ritwik Bhatia, Laurent Lecordier, and Ganesh Sundaram鈥淚n-Situ Monitoring of ALD Film Growth for Evaluation of Self Assembled Monolayers鈥,12th Intern. ALD conference, 2012, Dresden, Germany
  • L. Lecordier, R. Bhatia, M. Dalberth, G. Sundaram, and J. Becker 鈥淚n-Situ QCM, and Spectroscopic Ellipsometry During Thermal, and Plasma ALD Processing, 12th Intern. ALD conference, 2012, Dresden, Germany
  • R. Bhatia, 鈥淎tomic Layer Deposition of Metal Oxides for TFT Devices鈥, SEMICON West , San Francisco, CA, 2012
  • L. Lecordier, *鈥淧rinciples and Applications of Atomic Layer Deposition and Self Assembled Monolayers鈥, SPIE Nanotechnology Symposium, San Diego, CA, 2012
  • L. Lecordier, 鈥淪elf Assembled Monolayers鈥, International Micro and Nano Engineering Conference, Toulouse, France, 2012
  • M. Sowa , 鈥淩ole of PEALD reactor wall conditions on radical and ion substrate fluxes鈥, 59th International American Vacuum Society Symposium, Tampa, FL, 2012
  • L. Lecordier, 鈥淎dvances in roll-to-roll ALD Processing鈥, 59th International American Vacuum Society Symposium, Tampa, FL, 2012

2011

  • G.M. Sundaram et.al *鈥Fast Atomic Layer Deposition System for Flexible and Rigid Substrates鈥, Flextech International Conference, Phoenix庐 AZ, 2012
  • L. Lecordier et.al 鈥淔rom High Aspect Ratio Nanoscale to Roll-To-Roll Coating Review of Atomic Layer Deposition Principles and Emerging Applications鈥, L. Lecordier et.al, AVS New England Meeting, Boston, MA, 2011
  • A. O鈥橫ahony et al 鈥淪tructural and Electrical Characterisation of High-k Gate Oxide Structures Deposited by Atomic Layer Deposition鈥, International Conference of the Israel Vacuum Society, Te-Aviv, Israel, 2011
  • M. Dalberth et al, 鈥淩oll to Roll ALD: From prototype to manufacturing鈥, 11th Intern. ALD conference, 2011, Cambridge, MA
  • L. Lecordier et al 鈥淩apid vapor phase surface functionalization with hybrid SAMs / ALD heterostructures鈥, 11th Intern. ALD conference, 2011, Cambridge, MA
  • G.Liu et al, 鈥淗igh Rate Growth of SiO2 by Thermal ALD Using Tris(di-methylamino)silane and Ozone鈥, 11th Intern. ALD conference, 2011, Cambridge, MA
  • G.M.Sundaram et.al *鈥Industrial ALD Systems: The Role of Computation in Design鈥, 11th Intern. ALD conference, 2011, Cambridge, MA
  • 鈥淢aking Films One Layer at a Time鈥 C&EN, 2011
  • G.M. Sundaram et.al *鈥Industrialization of Atomic Layer Deposition: An approach to high speed depositions鈥, EuroCVD, Kinsale, Ireland, 2011
  • G.M. Sundaram et.al, *鈥Advances in FAST ALD Processes for R2R Applications鈥, Flextech Nanomaterials Workshop, Atlanta, GA, 2011
  • G. Liu et al, 鈥淎tomic Layer Deposition of AlN with Tris(Dimethylamido)aluminum and NH3鈥, International Meeting of the Electrochemical Society, Boston, MA, 2011
  • G.M. Sundaram et. al *鈥滱dvances in ALD Methods for Roll-to-Roll (R2R) Applications鈥, National Nanomanufacturing Network Workshop, Boston, MA, 2011
  • G.M. Sundaram et. al *鈥Industrialization of Atomic Layer Deposition: From Design to Deposition鈥, 58th International American Vacuum Society Symposium, Nashville, TN, 2011
  • M.J. Sowa et al, 鈥淔lexibility and Water Vapor Transmission Rates for Al-, Hf-, and Zr-based ALD films and Nanolaminates Utilizing Water and Glycerol Co-reactants鈥, 58th International American Vacuum Society Symposium, Nashville, TN, 2011

2010

  • G. Liu, A. Bertuch, M. Sowa, Ritwik Bhatia, E. Deguns, M. Dalberth, G. Sundaram, and Jill S. Becker, 鈥淧recursor Boost for Low Vapor Pressure ALD Precursors鈥, 10th Intern. ALD conference, 2010, Seoul, Korea
  • Sowa, M. J., et al, 鈥淩ole of process conditions for low-resistivity TiN via plasma enhanced ALD鈥, 10th Intern. ALD conference, 2010, Seoul, Korea
  • G. Sundaram, , , , and , , , , and , 鈥淟arge Format Atomic Layer Deposition鈥, 218th ECS Meeting, Atomic Layer Deposition Applications Volume 33, Issue 2, Las Vegas, NV, October 10-15, 2010
  • Brodie, A., et al., 鈥淔abrication of Coatings with Targeted Tunable Electrical Properties via ALD: Al2O3/ZnO Ta2O5/Nb2O5鈥, in ECS Transactions. 2010, ECS. p. 101-110
  • , , , , , , , and , 鈥淧roperties of Hafnium Oxide Deposited with Ozone or Oxygen Plasma鈥, 218th ECS Meeting, Atomic Layer Deposition Applications, October 10-15, 2010
  • Co-authored paper with KLA
  • M. Sowa, G. Sundaram, E. Deguns, R. Bhatia, M. Dalberth, A. Bertuch, G. Liu, and J. Becker 鈥淩ole of PEALD System Plasma Source Operation on Substrate Ion Bombardment and the Impact on HfO2 and TiN Film Properties鈥, 57th International American Vacuum Society Symposium, Albuquerque, NM, 2010
  • Deguns, E.W., “ALD Thin Films for Flexible Electronics: An Application Primer”. FlexTech Trends: News From the World for Displays and Flexible, Printed Electronics, 2010. 6: p. 7 – 11.
  • Deguns, E.W., et al., “A Stable Organometallic Precursor for Nb2O5” in Baltic ALD 2010 & GerALD 2. 2010: Hamburg, Germany
  • Deguns, E.W., et al., Plasma-Enabled ALD of Niobium Nitride Using an Organometallic Nb Precursor, in ECS Transactions. 2010, ECS. p. 177-182
  • Sowa, M.J., et al., “Pushing the ALD Envelope”. Ceramic Industry, 2010. 160(5): p. 20.
  • Baxter, J., “Cambridge NanoTech Solves ALD Valve Problem: A Case Study鈥. Gases & Instrumentation, 2010. 4(4).

2009

  • Sowa, M. J., et al, 鈥淩emote plasma source performance and its impact on film deposition rates and properties in a new, commercial ALD system鈥, 9th Intern. ALD conference, 2009, Monterey CA
  • Bhatia, R., et al., “Electrical and optical properties of metal doped zinc oxide” 9th International Conference on Atomic Layer Deposition. 2009: Monterey, CA
  • Dalberth, M.J., et al. “GaN nanowire resonators used as testbed for ALD film mechanical and deposition properties”, 9th International Conference on Atomic Layer Deposition. 2009. Monterey, CA
  • Sundaram, G.M., et al., “Thin Films for 3D: ALD for non-planar topographies”. Solid State Technology, 2009.
  • Ritwik Bhatia, Mark Dalberth, Ganesh Sundaram and Jill Becker, 鈥淭hickness and Composition Effects on the Electrical Conductivity of Doped ALD Zinc Oxide鈥, MRS Spring Symposium V 9.3 April 16, 2009, San Francisco, CA

2008

  • G.M Sundaram, D.J. Monsma, and J.S. Becker, 鈥*Leading Edge Atomic Layer Deposition Applications鈥, ECS Transactions 16 (4) 19-27, 2008
  • Daniel, J.H., et al., The interplay of materials in printed electronics”, in Materials Research Society Symposium Proceedings. 2008

2007

  • D.J. Monsma, and J.S. Becker, *鈥漇avannah庐 ALD Systems: Enabling Quick Results鈥, ECS Transactions, Volume 11, issue 7, 2007

* Invited